Publication:

The influence of N containing plasmas on low-k films

Date

2011

Journal article

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Files

20967.pdf 345.96 KB

Author(s)

Verdonck, Patrick

;

Aresti, Maitane

;

Ferchichi, Abdelkarim

;

Van Besien, Els

;

;

Trompoukis, Christos

;

De Roest, David

;

Baklanov, Mikhaïl

Journal

Microelectronic Engineering

Metrics

1859 since deposited on 2021-10-19

2last month

Acq. date: 2025-12-11