Publication:

Cleaning and surface preparation for SiGe and Ge channel device

Date

2010
Meeting abstract
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dc.contributor.authorWada, M
dc.contributor.authorTakahashi, H
dc.contributor.authorSnow, J
dc.contributor.authorVos, Rita
dc.contributor.authorMertens, Paul
dc.contributor.authorShirakawa, H
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.date.accessioned2021-10-19T00:10:56Z
dc.date.available2021-10-19T00:10:56Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18320
dc.source.beginpage7.3
dc.source.conference10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS
dc.source.conferencedate20/09/2010
dc.source.conferencelocationOostende Belgium
dc.title

Cleaning and surface preparation for SiGe and Ge channel device

dc.typeMeeting abstract
dspace.entity.typePublication
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