Rapid thermal annealing of spin-coated phosphoric acid films for shallow junction formation

dc.contributor.author	Sivoththaman, Sivanarayanamoorthy
dc.contributor.author	Laureys, Wim
dc.contributor.author	Nijs, Johan
dc.contributor.author	Mertens, Robert
dc.contributor.imecauthor	Mertens, Robert
dc.date.accessioned	2021-09-30T09:34:08Z
dc.date.available	2021-09-30T09:34:08Z
dc.date.embargo	9999-12-31
dc.date.issued	1997
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/2151
dc.source.beginpage	392
dc.source.endpage	394
dc.source.issue	3
dc.source.journal	Applied Physics Letters
dc.source.volume	71
dc.title	Rapid thermal annealing of spin-coated phosphoric acid films for shallow junction formation
dc.type	Journal article
dspace.entity.type	Publication
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