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Morphologies and growth modes of FeSi and beta-FeSi2 layers prepared by rapid thermal annealing

Date

1996
Proceedings Paper
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dc.contributor.authorAmesz, Peter Henk
dc.contributor.authorJorgensen, L. V.
dc.contributor.authorLibezny, Milan
dc.contributor.authorPoortmans, Jef
dc.contributor.authorNijs, Johan
dc.contributor.authorvan Veen, A.
dc.contributor.authorSchut, H.
dc.contributor.authorde Hosson, J. T. M.
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-09-29T14:15:59Z
dc.date.available2021-09-29T14:15:59Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1055
dc.source.beginpage373
dc.source.conferenceSilicide Thin Films - Fabrication, Properties, and Applications
dc.source.conferencedate27/11/1995
dc.source.conferencelocationBoston, MA USA
dc.source.endpage378
dc.title

Morphologies and growth modes of FeSi and beta-FeSi2 layers prepared by rapid thermal annealing

dc.typeProceedings paper
dspace.entity.typePublication
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