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Post metal etch polymer removal: an investigation of the cleaning to remove residual of Si-C and Si-F after fluorocarbon plama etch on the silicon surface
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2002 since deposited on 2021-10-06
Acq. date: 2026-01-09
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2002 since deposited on 2021-10-06
Acq. date: 2026-01-09
Citations