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Improved channel hot carrier reliability in p-FinFETs with replacement metal gate by a nitrogen post deposition anneal process
Publication:
Improved channel hot carrier reliability in p-FinFETs with replacement metal gate by a nitrogen post deposition anneal process
Date
2014-03
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Cho, Moon Ju
;
Arimura, Hiroaki
;
Lee, Jae Woo
;
Kaczer, Ben
;
Veloso, Anabela
;
Boccardi, Guillaume
;
Ragnarsson, Lars-Ake
;
Kauerauf, Thomas
;
Horiguchi, Naoto
;
Groeseneken, Guido
Journal
IEEE Transactions on Device and Materials Reliability
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1850
since deposited on 2021-10-22
Acq. date: 2025-10-23
Citations
Metrics
Views
1850
since deposited on 2021-10-22
Acq. date: 2025-10-23
Citations