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Anodic electrodeposition of continuous metal-organic framework films with robust adhesion by pre-anchored strategy

 
dc.contributor.authorGuo, Wei
dc.contributor.authorMonnens, Wouter
dc.contributor.authorZhang, Wei
dc.contributor.authorXie, Sijie
dc.contributor.authorHan, Ning
dc.contributor.authorZhou, Zhenyu
dc.contributor.authorChanut, Nicolas
dc.contributor.authorVanstreels, Kris
dc.contributor.authorAmeloot, Rob
dc.contributor.authorZhang, Xuan
dc.contributor.authorFransaer, Jan
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.date.accessioned2023-07-07T07:57:08Z
dc.date.available2023-02-16T03:20:23Z
dc.date.available2023-07-07T07:57:08Z
dc.date.issued2023
dc.description.wosFundingTextFunding from the National Natural Science Foundation of China (grant number 22005250) , National Key R & D Program of China (2022YFB2502000) and Research Foundation Flanders (FWO) (grant number 12ZV320N) are acknowledged. W. G, W. Z, and S. X are grateful to the China Scholarship Council. The authors also thank Prof. Ingrid De Wolf for her support in the nano -scratch tests, and Dr. Alexander Volodin and Zilong Qiu for the AFM measurement.
dc.identifier.doi10.1016/j.micromeso.2023.112443
dc.identifier.issn1387-1811
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41111
dc.publisherELSEVIER
dc.source.beginpageArt. 112443
dc.source.endpagena
dc.source.issueFebruary
dc.source.journalMICROPOROUS AND MESOPOROUS MATERIALS
dc.source.numberofpages9
dc.source.volume350
dc.subject.keywordsTHIN-FILMS
dc.subject.keywordsELECTROCHEMICAL DEPOSITION
dc.subject.keywordsGROWTH
dc.subject.keywordsPARTICLES
dc.subject.keywordsHKUST-1
dc.title

Anodic electrodeposition of continuous metal-organic framework films with robust adhesion by pre-anchored strategy

dc.typeJournal article
dspace.entity.typePublication
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