Publication:
Characterization of optical material properties for alternative EUV mask absorber materials
Date
| dc.contributor.author | Scholze, Frank | |
| dc.contributor.author | Laubis, Christian | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Luong, Vu | |
| dc.contributor.author | Edrisi, Arash | |
| dc.contributor.author | Van de Kruijs, Robbert | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.imecauthor | Luong, Vu | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.date.accessioned | 2021-10-23T14:42:46Z | |
| dc.date.available | 2021-10-23T14:42:46Z | |
| dc.date.issued | 2016 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27283 | |
| dc.source.conference | European Mask and Lithography Conference - EMLC | |
| dc.source.conferencedate | 21/06/2016 | |
| dc.source.conferencelocation | Dresden Germany | |
| dc.title | Characterization of optical material properties for alternative EUV mask absorber materials | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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