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Low temperature doping of silicon by hydrogen plasma treatments
Publication:
Low temperature doping of silicon by hydrogen plasma treatments
Date
2002
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Job, R.
;
Ulyashin, A.G.
;
Ma, Y.
;
Fahrner, W.R.
;
Simoen, Eddy
;
Rafi, Joan Marc
;
Claeys, Cor
;
Niedernostheide, F.J.
;
Schulze, H.J.
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2054
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
2054
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations