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Fabrication of uniform photonic devices using 193nm optical lithography in silicon-on-insulator

Date

2008-06
Proceedings Paper
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dc.contributor.authorSelvaraja, Shankar
dc.contributor.authorBogaerts, Wim
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorBaets, Roel
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorBaets, Roel
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.date.accessioned2021-10-17T10:40:31Z
dc.date.available2021-10-17T10:40:31Z
dc.date.embargo9999-12-31
dc.date.issued2008-06
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14458
dc.source.beginpage359
dc.source.conference14th European Conference on Integrated Optics - ECIO
dc.source.conferencedate11/06/2008
dc.source.conferencelocationEindhoven the Netherlands
dc.source.endpage362
dc.title

Fabrication of uniform photonic devices using 193nm optical lithography in silicon-on-insulator

dc.typeProceedings paper
dspace.entity.typePublication
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