Publication:
Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasma–surface simulations and experiments
Date
| dc.contributor.author | Tinck, Stefan | |
| dc.contributor.author | Boullart, Werner | |
| dc.contributor.author | Bogaerts, Annemie | |
| dc.contributor.imecauthor | Boullart, Werner | |
| dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
| dc.date.accessioned | 2021-10-18T03:38:30Z | |
| dc.date.available | 2021-10-18T03:38:30Z | |
| dc.date.issued | 2009 | |
| dc.identifier.issn | 0022-3727 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16311 | |
| dc.source.beginpage | 95204 | |
| dc.source.endpage | 95217 | |
| dc.source.journal | Journal of Physics D: Applied Physics | |
| dc.source.volume | 42 | |
| dc.title | Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasma–surface simulations and experiments | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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