Publication:
Special issue on scaling limits of gate oxides - Foreword
Date
| dc.contributor.author | Degraeve, Robin | |
| dc.contributor.imecauthor | Degraeve, Robin | |
| dc.date.accessioned | 2021-10-14T12:51:39Z | |
| dc.date.available | 2021-10-14T12:51:39Z | |
| dc.date.issued | 2000 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4301 | |
| dc.source.beginpage | U3 | |
| dc.source.issue | 5 | |
| dc.source.journal | Semiconductor Science and Technology | |
| dc.source.volume | 15 | |
| dc.title | Special issue on scaling limits of gate oxides - Foreword | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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