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Novel, effective and cost-efficient method of introducing fluorine into metal/Hf-based gate stack in MuGFET and planar SOI devices with significant BTI improvement

Date

2007
Proceedings Paper
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dc.contributor.authorShickova, Adelina
dc.contributor.authorCollaert, Nadine
dc.contributor.authorZimmerman, Paul
dc.contributor.authorDemand, Marc
dc.contributor.authorSimoen, Eddy
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorTrojman, Lionel
dc.contributor.authorFerain, Isabelle
dc.contributor.authorLeys, Frederik
dc.contributor.authorBoullart, Werner
dc.contributor.authorFranquet, Alexis
dc.contributor.authorKaczer, Ben
dc.contributor.authorJurczak, Gosia
dc.contributor.authorMaes, Herman
dc.contributor.authorGroeseneken, Guido
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.date.accessioned2021-10-16T19:40:05Z
dc.date.available2021-10-16T19:40:05Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12889
dc.source.beginpage112
dc.source.conferenceSymposium on VLSI Technology. Digest of Technical Papers
dc.source.conferencedate14/06/2007
dc.source.conferencelocationKyoto Japan
dc.source.endpage113
dc.title

Novel, effective and cost-efficient method of introducing fluorine into metal/Hf-based gate stack in MuGFET and planar SOI devices with significant BTI improvement

dc.typeProceedings paper
dspace.entity.typePublication
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