Publication:

Gate patterning development for monolithic CFET integration

Date

2023-02-28
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dc.contributor.authorDupuy, Emmanuel
dc.contributor.authorTao, Zheng
dc.contributor.authorMertens, Hans
dc.contributor.authorDemuynck, Steven
dc.contributor.authorHosseini, Maryam
dc.contributor.authorZhou, Daisy
dc.contributor.authorWang, Shouhua
dc.contributor.authorSebaai, Farid
dc.contributor.authorBatuk, Dmitry
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorChan, BT
dc.contributor.authorLazzarino, Frederic
dc.contributor.imecauthorDupuy, Emmanuel
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorHosseini, Maryam
dc.contributor.imecauthorZhou, Daisy
dc.contributor.imecauthorWang, Shouhua
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorBatuk, Dmitry
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.orcidimecDupuy, Emmanuel::0000-0003-3341-1618
dc.contributor.orcidimecHosseini, Maryam::0000-0002-0210-4095
dc.contributor.orcidimecWang, Shouhua::0000-0002-9105-8552
dc.contributor.orcidimecBatuk, Dmitry::0000-0002-6384-6690
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecMertens, Hans::0000-0002-3392-6892
dc.contributor.orcidimecZhou, Daisy::0000-0003-4501-8004
dc.contributor.orcidimecSebaai, Farid::0009-0008-0186-6101
dc.date.accessioned2025-06-19T08:11:48Z
dc.date.available2023-01-09T09:35:16Z
dc.date.available2025-06-19T08:11:48Z
dc.date.embargo9999-12-31
dc.date.issued2023-02-28
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40956
dc.source.conferenceSPIE Advanced Lithography + Patterning 2023
dc.source.conferencedate2023-02-28
dc.source.conferencelocationSan Jose, Ca, USA
dc.subject.disciplineElectrical & electronic engineering
dc.subject.keywordsPlasma etching, Gate, CFET, EUV
dc.title

Gate patterning development for monolithic CFET integration

dc.typeOral presentation
dspace.entity.typePublication
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