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Monitoring of local and global temperature non-uniformities by means of Therma-Probe and Micro Four-Point Probe metrology

Date

2009
Proceedings Paper
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dc.contributor.authorRosseel, Erik
dc.contributor.authorPetersen, Dirch
dc.contributor.authorOsterberg, Frederik
dc.contributor.authorHansen, Ole
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorClarysse, Trudo
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorOrtolland, Claude
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorChan, Philip
dc.contributor.authorSalnik, Alex
dc.contributor.authorNicolaides, Lena
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.date.accessioned2021-10-18T02:29:31Z
dc.date.available2021-10-18T02:29:31Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16140
dc.source.conference17th Annual IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP
dc.source.conferencedate29/09/2009
dc.source.conferencelocationAlbany, NY USA
dc.title

Monitoring of local and global temperature non-uniformities by means of Therma-Probe and Micro Four-Point Probe metrology

dc.typeProceedings paper
dspace.entity.typePublication
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