Defectivity study of Cu metallization process by dark- and bright-field inspection

dc.contributor.author	Carbonell, Laure
dc.contributor.author	Holsteyns, Frank
dc.contributor.author	Tokei, Zsolt
dc.contributor.author	O'Reilly, L.
dc.contributor.author	Maex, Karen
dc.contributor.author	Mertens, Paul
dc.contributor.imecauthor	Holsteyns, Frank
dc.contributor.imecauthor	Tokei, Zsolt
dc.contributor.imecauthor	Maex, Karen
dc.contributor.imecauthor	Mertens, Paul
dc.date.accessioned	2021-10-15T04:05:30Z
dc.date.available	2021-10-15T04:05:30Z
dc.date.issued	2003
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/7275
dc.source.beginpage	281
dc.source.conference	Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS
dc.source.conferencedate	16/09/2002
dc.source.conferencelocation	Oostende Belgium
dc.source.endpage	287
dc.title	Defectivity study of Cu metallization process by dark- and bright-field inspection
dc.type	Proceedings paper
dspace.entity.type	Publication
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