Publication:
Characterization of reduced-pressure chemical vapor deposition polycrystalline silicon germanium deposited at temperatures <= 550 degrees C
Date
| dc.contributor.author | Sedky, S. | |
| dc.contributor.author | Witvrouw, Ann | |
| dc.contributor.author | Caymax, Matty | |
| dc.contributor.author | Saerens, A. | |
| dc.contributor.author | Van Houtte, P. | |
| dc.contributor.imecauthor | Caymax, Matty | |
| dc.date.accessioned | 2021-10-14T23:07:32Z | |
| dc.date.available | 2021-10-14T23:07:32Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6814 | |
| dc.source.beginpage | 1580 | |
| dc.source.endpage | 1586 | |
| dc.source.issue | 7 | |
| dc.source.journal | Journal of Materials Research | |
| dc.source.volume | 17 | |
| dc.title | Characterization of reduced-pressure chemical vapor deposition polycrystalline silicon germanium deposited at temperatures <= 550 degrees C | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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