Publication:
Effect of Al2O3 and SiO2 Abrasives on the CMP of molybdenum using different polishing parameters
Date
| dc.contributor.author | Kalantzis, Panagiotis | |
| dc.contributor.author | Teugels, Lieve | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.imecauthor | Kalantzis, Panagiotis | |
| dc.contributor.imecauthor | Teugels, Lieve | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.orcidimec | Teugels, Lieve::0000-0002-6613-9414 | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.date.accessioned | 2021-10-24T06:31:10Z | |
| dc.date.available | 2021-10-24T06:31:10Z | |
| dc.date.issued | 2017-10 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/28624 | |
| dc.source.conference | International Conference on Planarization/CMP Technology - ICPT | |
| dc.source.conferencedate | 11/10/2017 | |
| dc.source.conferencelocation | Leuven Belgium | |
| dc.title | Effect of Al2O3 and SiO2 Abrasives on the CMP of molybdenum using different polishing parameters | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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