Internal photoemission of electrons from Ta-based conductors into SiO2 and HfO2 insulators

dc.contributor.author	Shamuilia, S.
dc.contributor.author	Afanasiev, Valeri
dc.contributor.author	Stesmans, Andre
dc.contributor.author	Schram, Tom
dc.contributor.author	Pantisano, Luigi
dc.contributor.imecauthor	Afanasiev, Valeri
dc.contributor.imecauthor	Stesmans, Andre
dc.contributor.imecauthor	Schram, Tom
dc.date.accessioned	2021-10-17T10:41:54Z
dc.date.available	2021-10-17T10:41:54Z
dc.date.embargo	9999-12-31
dc.date.issued	2008
dc.identifier.issn	0021-8979
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/14462
dc.source.beginpage	73722
dc.source.issue	7
dc.source.journal	Journal of Applied Physics
dc.source.volume	104
dc.title	Internal photoemission of electrons from Ta-based conductors into SiO2 and HfO2 insulators
dc.type	Journal article
dspace.entity.type	Publication
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