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Technology benchmarking of copper electromigration using a grain-sensitive simulation framework

 
dc.contributor.authorSaleh, Ahmed
dc.contributor.authorCroes, Kristof
dc.contributor.authorCeric, H.
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorZahedmanesh, Houman
dc.contributor.imecauthorSaleh, A. S.
dc.contributor.imecauthorCroes, K.
dc.contributor.imecauthorDe Wolf, I
dc.contributor.imecauthorZahedmanesh, H.
dc.date.accessioned2025-03-06T20:45:29Z
dc.date.available2025-03-06T20:45:29Z
dc.date.issued2024
dc.identifier.doi10.1109/IITC61274.2024.10732543
dc.identifier.eisbn979-8-3503-8517-5
dc.identifier.isbn979-8-3503-8518-2
dc.identifier.issn2380-632X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45318
dc.publisherIEEE
dc.source.conference2024 International Interconnect Technology Conference
dc.source.conferencedate2024-06-03
dc.source.conferencelocationSan Jose
dc.source.numberofpages3
dc.title

Technology benchmarking of copper electromigration using a grain-sensitive simulation framework

dc.typeProceedings paper
dspace.entity.typePublication
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