Publication:

EUV lithography: status and further challenges towards a maturing technology

Date

2010
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dc.contributor.authorVandenberghe, Geert
dc.contributor.authorHendrickx, Eric
dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorGronheid, Roel
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-18T23:18:32Z
dc.date.available2021-10-18T23:18:32Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18211
dc.source.conferenceGigaphoton seminar @ Semicon Japan
dc.source.conferencedate3/12/2010
dc.source.conferencelocationChiba Japan
dc.title

EUV lithography: status and further challenges towards a maturing technology

dc.typeOral presentation
dspace.entity.typePublication
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