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Time and temperature dependence of early stages of stress-induced-voiding in Cu/low-k interconnects
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Time and temperature dependence of early stages of stress-induced-voiding in Cu/low-k interconnects
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Date
2009
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Croes, Kristof
;
Wilson, Chris
;
Lofrano, Melina
;
Travaly, Youssef
;
De Roest, David
;
Tokei, Zsolt
;
Beyer, Gerald
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Views
1835
since deposited on 2021-10-17
4
last month
3
last week
Acq. date: 2026-02-24
Citations