Publication:

DUV resist materials and processes for 0.25 μm and 0.18 μm CMOS devices

Date

1996
Presentation
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dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan den hove, Luc
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.date.accessioned2021-09-29T15:16:12Z
dc.date.available2021-09-29T15:16:12Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1401
dc.source.conferenceMeeting of the Research Group on Polymers for Microelectronics and Photonics; July 1996
dc.source.conferencelocationTokyo Japan
dc.title

DUV resist materials and processes for 0.25 μm and 0.18 μm CMOS devices

dc.typeOral presentation
dspace.entity.typePublication
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