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Plasma etch challenges and processing optimization in spin logic device fabrication
Publication:
Plasma etch challenges and processing optimization in spin logic device fabrication
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Date
2022-11-08
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Canvel, Yann
;
Souriau, Laurent
;
Wan, Danny
;
Trovato, Anna
;
Thiam, Arame
;
Tsvetanova, Diana
;
Carpenter, Robert
;
Raymenants, Eline
;
Asselberghs, Inge
;
Lazzarino, Frederic
;
Couet, Sebastien
;
Kar, Gouri Sankar
;
Nguyen, Van Dai
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945
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Acq. date: 2025-12-15
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Metrics
Views
945
since deposited on 2022-11-14
8
last month
2
last week
Acq. date: 2025-12-15
Citations