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Influence of CH4/H2 reactive ion etching on the electrical and optical properties of AlGaAs/GaAs/InGaAs/GaAs heterostructures
Publication:
Influence of CH4/H2 reactive ion etching on the electrical and optical properties of AlGaAs/GaAs/InGaAs/GaAs heterostructures
Date
1995
Proceedings Paper
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384.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
van Es, C. M.
;
Eijkemans, T. J.
;
Wolter, J. H.
;
Pereira, Ricardo
;
Van Hove, Marleen
;
Van Rossum, Marc
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1976
since deposited on 2021-09-29
Acq. date: 2025-10-25
Citations
Metrics
Views
1976
since deposited on 2021-09-29
Acq. date: 2025-10-25
Citations