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Articles
CHC degradation of strained devices based on SiON and high-k gate dielectric materials
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CHC degradation of strained devices based on SiON and high-k gate dielectric materials
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Date
2011
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Amat, E.
;
Rodriguez, R.
;
Bargallo Gonzalez, Mireia
;
Martin-Martinez, J.
;
Nafria, M.
;
Aymerich, X.
;
Verheyen, Peter
;
Simoen, Eddy
Journal
Microelectronic Engineering
Abstract
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1878
since deposited on 2021-10-19
Acq. date: 2025-12-09
Citations
Metrics
Views
1878
since deposited on 2021-10-19
Acq. date: 2025-12-09
Citations