Publication:

Multi trigger resist for EUV lithography

Date

2018

Journal article

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Files

41018.pdf 3.36 MB

Author(s)

Popescu, Carmen

;

Vesters, Yannick

;

McClelland, Alexandra

;

De Simone, Danilo

;

;

;

Theis, Wolfgang

;

Vandenberghe, Geert

;

Journal

Journal of Photopolymer Science and Technology

Statistics

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