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Articles
Multi trigger resist for EUV lithography
Publication:
Multi trigger resist for EUV lithography
Date
2018
Journal article
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41018.pdf
3.36 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Popescu, Carmen
;
Vesters, Yannick
;
McClelland, Alexandra
;
De Simone, Danilo
;
Dawson, Guy
;
Roth, John
;
Theis, Wolfgang
;
Vandenberghe, Geert
;
Robinson, Alex
Journal
Journal of Photopolymer Science and Technology
Abstract
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1922
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Acq. date: 2025-10-25
Citations
Metrics
Views
1922
since deposited on 2021-10-26
437
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations