Publication:

Electron trap generation at different temperatures in the gate oxide

Date

2002
Presentation
Simple item page Full metadata Statistics
 
dc.contributor.authorZhang, W.D.
dc.contributor.authorZhang, J.F.
dc.contributor.authorWood, M.
dc.contributor.authorLalor, M.
dc.contributor.authorBurton, D.
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorDegraeve, Robin
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorDegraeve, Robin
dc.date.accessioned2021-10-15T00:12:24Z
dc.date.available2021-10-15T00:12:24Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7097
dc.source.conference33rd IEEE Semiconductor Interface Specialists Conference - SISC
dc.source.conferencedate5/12/2002
dc.source.conferencelocationSan Diego, CA USA
dc.title

Electron trap generation at different temperatures in the gate oxide

dc.typeOral presentation
dspace.entity.typePublication
Files
Publication available in collections:
Presentations