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Correlation between field dependent electrical conduction and dielectric breakdown in a SiOCH based low-k (k=2.0) dielectric
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Correlation between field dependent electrical conduction and dielectric breakdown in a SiOCH based low-k (k=2.0) dielectric
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Date
2013
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wu, Chen
;
Li, Yunlong
;
Barbarin, Yohan
;
Ciofi, Ivan
;
Croes, Kristof
;
Boemmels, Juergen
;
De Wolf, Ingrid
;
Tokei, Zsolt
Journal
Applied Physics Letters
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1950
since deposited on 2021-10-21
Acq. date: 2025-12-10
Citations
Metrics
Views
1950
since deposited on 2021-10-21
Acq. date: 2025-12-10
Citations