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Comparative analysis of the factors leading to low-k degradation during the integration process

Date

2014
Meeting abstract
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dc.contributor.authorZotovich, Alexey
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.accessioned2021-10-22T09:03:29Z
dc.date.available2021-10-22T09:03:29Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24900
dc.source.conferenceInternational Conference in Micro- and Nanoelectronics
dc.source.conferencedate6/10/2014
dc.source.conferencelocationMoscow Russia
dc.title

Comparative analysis of the factors leading to low-k degradation during the integration process

dc.typeMeeting abstract
dspace.entity.typePublication
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