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Nanoscale electrical characterization of HfO2/SiO2/MOS gate stackx with enhanced-CAFM

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1955 since deposited on 2021-10-16
1last month
Acq. date: 2026-01-26

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1955 since deposited on 2021-10-16
1last month
Acq. date: 2026-01-26

Citations