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Nanoscale electrical characterization of HfO2/SiO2/MOS gate stackx with enhanced-CAFM
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1954 since deposited on 2021-10-16
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Acq. date: 2025-12-09
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1954 since deposited on 2021-10-16
1last month
1last week
Acq. date: 2025-12-09
Citations