Publication:
Ni-based silicides: material issues for advanced CMOS applications
Date
| dc.contributor.author | Kittl, Jorge | |
| dc.contributor.author | Lauwers, Anne | |
| dc.contributor.author | Chamirian, Oxana | |
| dc.contributor.author | Van Dal, Mark | |
| dc.contributor.author | Akheyar, Amal | |
| dc.contributor.author | Richard, Olivier | |
| dc.contributor.author | Lisoni, Judit | |
| dc.contributor.author | de Potter de ten Broeck, Muriel | |
| dc.contributor.author | Lindsay, Richard | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | Lauwers, Anne | |
| dc.contributor.imecauthor | Van Dal, Mark | |
| dc.contributor.imecauthor | Richard, Olivier | |
| dc.contributor.imecauthor | de Potter de ten Broeck, Muriel | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.contributor.orcidimec | Richard, Olivier::0000-0002-3994-8021 | |
| dc.date.accessioned | 2021-10-15T05:11:34Z | |
| dc.date.available | 2021-10-15T05:11:34Z | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7742 | |
| dc.source.beginpage | 177 | |
| dc.source.conference | Advanced Short-Time Thermal Processing for Si-based CMOS devices | |
| dc.source.conferencedate | 27/04/2003 | |
| dc.source.conferencelocation | Paris France | |
| dc.source.endpage | 182 | |
| dc.title | Ni-based silicides: material issues for advanced CMOS applications | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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