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In-line ambient impurity measurement of a rapid thermal process chamber by using atmospheric pressure ionization mass spectrometer

Date

1998
Proceedings Paper
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dc.contributor.authorKondoh, Eiichi
dc.contributor.authorVereecke, Guy
dc.contributor.authorHeyns, Marc
dc.contributor.authorMaex, Karen
dc.contributor.authorGutt, T.
dc.contributor.authorNényei, Z.
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-09-30T12:23:34Z
dc.date.available2021-09-30T12:23:34Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2679
dc.source.beginpage51
dc.source.conferenceRapid Thermal and Integrated Processing VII
dc.source.conferencedate13/04/1998
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage56
dc.title

In-line ambient impurity measurement of a rapid thermal process chamber by using atmospheric pressure ionization mass spectrometer

dc.typeProceedings paper
dspace.entity.typePublication
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