Publication:

Breakdown induced thermo-chemical reactions in HfO2 high-k/poly-silicon gate stacks

Date

2005
Journal article
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dc.contributor.authorRanjan, R.
dc.contributor.authorPey, K.L.
dc.contributor.authorTung, C.H.
dc.contributor.authorTang, L.J.
dc.contributor.authorAng, D.S.
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBera, L.K.
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-16T04:24:49Z
dc.date.available2021-10-16T04:24:49Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11083
dc.source.beginpage242907-1
dc.source.endpage242907-3
dc.source.issue24
dc.source.journalApplied Physics Letters
dc.source.volume87
dc.title

Breakdown induced thermo-chemical reactions in HfO2 high-k/poly-silicon gate stacks

dc.typeJournal article
dspace.entity.typePublication
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