Publication:

Motion artifact reduction for wrist-worn photoplethysmograph sensors based on different wavelengths

Date

2019
Journal article
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dc.contributor.authorZhang, Yifan
dc.contributor.authorSong, Shuang
dc.contributor.authorVullings, Rik
dc.contributor.authorBiswas, Dwaipayan
dc.contributor.authorSimoes Capela, Neide
dc.contributor.authorVan Helleputte, Nick
dc.contributor.authorVan Hoof, Chris
dc.contributor.authorGroenendaal, Willemijn
dc.contributor.imecauthorSong, Shuang
dc.contributor.imecauthorBiswas, Dwaipayan
dc.contributor.imecauthorSimoes Capela, Neide
dc.contributor.imecauthorVan Helleputte, Nick
dc.contributor.imecauthorVan Hoof, Chris
dc.contributor.imecauthorGroenendaal, Willemijn
dc.contributor.orcidimecVan Helleputte, Nick::0000-0002-7511-1923
dc.contributor.orcidimecVan Hoof, Chris::1234-1234-1234-1234
dc.contributor.orcidimecGroenendaal, Willemijn::0000-0003-1024-0756
dc.date.accessioned2021-10-28T00:47:36Z
dc.date.available2021-10-28T00:47:36Z
dc.date.embargo9999-12-31
dc.date.issued2019
dc.identifier.issn1424-8220
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34542
dc.identifier.urlhttps://www.mdpi.com/1424-8220/19/3/673
dc.source.beginpage673
dc.source.issue3
dc.source.journalSensors
dc.source.volume19
dc.title

Motion artifact reduction for wrist-worn photoplethysmograph sensors based on different wavelengths

dc.typeJournal article
dspace.entity.typePublication
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