Publication:

Performance improvement of self-aligned HfO2/TaN and SiON/TaN nMOS transistors

Date

 
dc.contributor.authorSchram, Tom
dc.contributor.imecauthorSchram, Tom
dc.date.accessioned2021-10-15T16:06:33Z
dc.date.available2021-10-15T16:06:33Z
dc.date.issued2004-06
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9570
dc.source.conference13th workshop on Dielectrics in Microelectronics - WODIM
dc.source.conferencedate28/06/2004
dc.source.conferencelocationCork Ireland
dc.title

Performance improvement of self-aligned HfO2/TaN and SiON/TaN nMOS transistors

dc.typeMeeting abstract
dspace.entity.typePublication
Files
Publication available in collections: