CMP on SiGe materials – linking chemical and physical properties to design low defect and selective slurries

dc.contributor.author	Ong, Patrick
dc.contributor.author	Siebert, Max
dc.contributor.author	Leunissen, Leonardus H. A.
dc.contributor.author	Ibrahim, Sheikh Ansar Usman
dc.contributor.author	Teugels, Lieve
dc.contributor.imecauthor	Ong, Patrick
dc.contributor.imecauthor	Teugels, Lieve
dc.contributor.orcidimec	Ong, Patrick::0000-0002-2072-292X
dc.contributor.orcidimec	Teugels, Lieve::0000-0002-6613-9414
dc.date.accessioned	2021-10-22T04:27:24Z
dc.date.available	2021-10-22T04:27:24Z
dc.date.issued	2014
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/24345
dc.source.conference	International Conference on Planarization Technology - ICPT
dc.source.conferencedate	19/11/2014
dc.source.conferencelocation	Kobe Japan
dc.title	CMP on SiGe materials – linking chemical and physical properties to design low defect and selective slurries
dc.type	Proceedings paper
dspace.entity.type	Publication
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