Publication:

In-line sheet resistance measurements of nanometer-wide semiconducting fins

Date

2017
Proceedings Paper
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dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorFolkersma, Steven
dc.contributor.authorSchulze, Andreas
dc.contributor.authorMoussa, Alain
dc.contributor.authorMerckling, Clement
dc.contributor.authorKunert, Bernardette
dc.contributor.authorGuo, Weiming
dc.contributor.authorPetersen, Dirch
dc.contributor.authorWitthoft, Maria-Louise
dc.contributor.authorHansen, Ole
dc.contributor.authorHenrichsen, Henrik
dc.contributor.authorNielsen, Peter
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorFolkersma, Steven
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorMerckling, Clement
dc.contributor.imecauthorKunert, Bernardette
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.contributor.orcidimecMerckling, Clement::0000-0003-3084-2543
dc.contributor.orcidimecKunert, Bernardette::0000-0002-8986-4109
dc.date.accessioned2021-10-24T03:02:49Z
dc.date.available2021-10-24T03:02:49Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27875
dc.source.conferenceInternational Conference on Frontiers of Characterization and Metrology for Nanoelectronics - FCMN
dc.source.conferencedate21/03/2017
dc.source.conferencelocationMonterey, CA USA
dc.title

In-line sheet resistance measurements of nanometer-wide semiconducting fins

dc.typeProceedings paper
dspace.entity.typePublication
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