Publication:

Impact of interface layer on charge trapping in Si:HfO2 based FeF FT

Date

2020

Proceedings Paper

https://doi.org/10.1109/IIRW49815.2020.9312866

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Author(s)

;

O'Sullivan, Barry

;

;

Linten, Dimitri

;

Shin, Changhwan

;

Journal

na

Statistics

1853 since deposited on 2021-11-02

Acq. date: 2026-02-24