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In-situ SEM observation of electromigration in thin metal films at accelerated stress conditions

Date

2000
Journal article
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dc.contributor.authorD'Haen, Jan
dc.contributor.authorVan Olmen, Jan
dc.contributor.authorBeelen, Z.
dc.contributor.authorManca, Jean
dc.contributor.authorMartens, T.
dc.contributor.authorDe Ceuninck, Ward
dc.contributor.authorD'Olieslaeger, Marc
dc.contributor.authorSchepper, L.
dc.contributor.authorCannaerts, M.
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorD'Haen, Jan
dc.contributor.imecauthorVan Olmen, Jan
dc.contributor.imecauthorDe Ceuninck, Ward
dc.contributor.imecauthorD'Olieslaeger, Marc
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-14T12:46:21Z
dc.date.available2021-10-14T12:46:21Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4228
dc.source.beginpage1407
dc.source.endpage1412
dc.source.issue8_10
dc.source.journalMicroelectronics Reliability
dc.source.volume40
dc.title

In-situ SEM observation of electromigration in thin metal films at accelerated stress conditions

dc.typeJournal article
dspace.entity.typePublication
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