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Ferroelectric Switching in FEFET: Physics of the Atomic Mechanism and Switching Dynamics in HfZrOx, HfO2 with Oxygen Vacancies and Si dopants

 
dc.contributor.authorClima, Sergiu
dc.contributor.authorO'Sullivan, Barry
dc.contributor.authorRonchi, Nicolo
dc.contributor.authorGarcia Bardon, Marie
dc.contributor.authorBanerjee, Kaustuv
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorVan Houdt, Jan
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorO'Sullivan, B. J.
dc.contributor.imecauthorRonchi, N.
dc.contributor.imecauthorBardon, M. G.
dc.contributor.imecauthorBanerjee, K.
dc.contributor.imecauthorVan den Bosch, G.
dc.contributor.imecauthorPourtois, G.
dc.contributor.imecauthorVan Houdt, J.
dc.contributor.imecauthorO'Sullivan, Barry
dc.contributor.imecauthorRonchi, Nicolo
dc.contributor.imecauthorGarcia Bardon, Marie
dc.contributor.imecauthorBanerjee, Kaustuv
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.contributor.orcidimecO'Sullivan, Barry::0000-0002-9036-8241
dc.contributor.orcidimecRonchi, Nicolo::0000-0002-7961-4077
dc.contributor.orcidimecBanerjee, Kaustuv::0000-0001-8003-6211
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecVan Houdt, Jan::1234-1234-1234-1235
dc.date.accessioned2022-01-10T12:08:20Z
dc.date.available2021-12-06T02:06:49Z
dc.date.available2022-01-10T12:08:20Z
dc.date.issued2020
dc.identifier.doi10.1109/IEDM13553.2020.9372117
dc.identifier.eisbn978-1-7281-8888-1
dc.identifier.issn2380-9248
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38557
dc.publisherIEEE
dc.source.conferenceIEEE International Electron Devices Meeting (IEDM)
dc.source.conferencedateDEC 12-18, 2020
dc.source.conferencelocationVirtual
dc.source.journalna
dc.source.numberofpages4
dc.title

Ferroelectric Switching in FEFET: Physics of the Atomic Mechanism and Switching Dynamics in HfZrOx, HfO2 with Oxygen Vacancies and Si dopants

dc.typeProceedings paper
dspace.entity.typePublication
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