Publication:
Self-aligned double patterning process for subtractive Ge Fin fabrication at 45-nm pitch
Date
| dc.contributor.author | Milenin, Alexey | |
| dc.contributor.author | Witters, Liesbeth | |
| dc.contributor.author | Barla, Kathy | |
| dc.contributor.author | Thean, Aaron | |
| dc.contributor.imecauthor | Milenin, Alexey | |
| dc.contributor.imecauthor | Witters, Liesbeth | |
| dc.contributor.imecauthor | Barla, Kathy | |
| dc.contributor.imecauthor | Thean, Aaron | |
| dc.contributor.orcidimec | Milenin, Alexey::0000-0003-0747-0462 | |
| dc.date.accessioned | 2021-10-23T12:51:07Z | |
| dc.date.available | 2021-10-23T12:51:07Z | |
| dc.date.issued | 2016 | |
| dc.identifier.issn | 0040-6090 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27012 | |
| dc.identifier.url | http://www.sciencedirect.com/science/article/pii/S0040609015007968 | |
| dc.source.beginpage | 64 | |
| dc.source.endpage | 67 | |
| dc.source.journal | Thin Solid Films | |
| dc.source.volume | 602 | |
| dc.title | Self-aligned double patterning process for subtractive Ge Fin fabrication at 45-nm pitch | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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