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Simulation of Ar/Cl2/O2 inductively coupled plasmas used for anisotropic etching of silicon
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1850 since deposited on 2021-10-18
5last month
Acq. date: 2025-12-11
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1850 since deposited on 2021-10-18
5last month
Acq. date: 2025-12-11
Citations