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Electron trapping in HfAI0 high-k stack for Flash memory applications: an origin of Vth window closure during cyclling operations
Publication:
Electron trapping in HfAI0 high-k stack for Flash memory applications: an origin of Vth window closure during cyclling operations
Date
2011-05
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zheng, X.F.
;
Robinson, Colin
;
Zhang, W.D.
;
Zhang, Jian Fu
;
Govoreanu, Bogdan
;
Van Houdt, Jan
Journal
IEEE Transactions on Electron Devices
Abstract
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1907
since deposited on 2021-10-19
Acq. date: 2025-10-24
Citations
Metrics
Views
1907
since deposited on 2021-10-19
Acq. date: 2025-10-24
Citations