Publication:
Ideal chemistry for reactive ion etching of GaN
Date
| dc.contributor.author | Karouta, F. | |
| dc.contributor.author | Jacobs, B. | |
| dc.contributor.author | Jacobs, Koen | |
| dc.contributor.author | Moerman, Ingrid | |
| dc.contributor.imecauthor | Moerman, Ingrid | |
| dc.contributor.orcidimec | Moerman, Ingrid::0000-0003-2377-3674 | |
| dc.date.accessioned | 2021-10-06T11:28:50Z | |
| dc.date.available | 2021-10-06T11:28:50Z | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3549 | |
| dc.source.conference | LEOS Workshop; Amsterdam. | |
| dc.title | Ideal chemistry for reactive ion etching of GaN | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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