Publication:
Precursor penetration and sealing of porous CVD SiCOH low k dielectric for atomic layer deposition of WCxNy
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1926 since deposited on 2021-10-15
1last month
Acq. date: 2026-01-06
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1926 since deposited on 2021-10-15
1last month
Acq. date: 2026-01-06
Citations