Publication:
Low damage ultra-low-k patterning using a high boiling point organic (HBPO) combined with NF3
Date
| dc.contributor.author | Chanson, Romain | |
| dc.contributor.author | Tahara, Shigeru | |
| dc.contributor.author | Vanstreels, Kris | |
| dc.contributor.author | de Marneffe, Jean-Francois | |
| dc.contributor.imecauthor | Vanstreels, Kris | |
| dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
| dc.contributor.orcidimec | Vanstreels, Kris::0000-0002-4420-0966 | |
| dc.date.accessioned | 2021-10-25T17:08:52Z | |
| dc.date.available | 2021-10-25T17:08:52Z | |
| dc.date.issued | 2018 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/30389 | |
| dc.identifier.url | http://iopscience.iop.org/article/10.1088/2516-1067/aad92e/meta | |
| dc.source.beginpage | 15006 | |
| dc.source.journal | Plasma Research Express (IOP) | |
| dc.source.volume | 1 | |
| dc.title | Low damage ultra-low-k patterning using a high boiling point organic (HBPO) combined with NF3 | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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