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Channel hot-carrier degradation under static stress in short channel transistors with high-k/metal gate stacks
Publication:
Channel hot-carrier degradation under static stress in short channel transistors with high-k/metal gate stacks
Date
2008
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Amat, E.
;
Kauerauf, Thomas
;
Degraeve, Robin
;
De Keersgieter, An
;
Rodríguez, R.
;
Nafría, M.
;
Aymerich, X.
;
Groeseneken, Guido
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1877
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1877
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations