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High-k metal gate MOSFETs: Impact of extrinsic process condition on the gate-stack quality. A mobility study
Publication:
High-k metal gate MOSFETs: Impact of extrinsic process condition on the gate-stack quality. A mobility study
Date
2007-03
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Trojman, Lionel
;
Ragnarsson, Lars-Ake
;
O'Sullivan, Barry
;
Rosmeulen, Maarten
;
Kaushik, Vidya
;
Groeseneken, Guido
;
Maes, Herman
;
De Gendt, Stefan
;
Heyns, Marc
Journal
IEEE Trans. Electron Devices
Abstract
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1890
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1890
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations