Publication:

DUV Lithography for 0.35 µm CMOS Processing

Date

1994
Presentation
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dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorGoethals, Mieke
dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.contributor.imecauthorVan Driessche, Veerle
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.date.accessioned2021-09-29T12:49:29Z
dc.date.available2021-09-29T12:49:29Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/390
dc.source.conferenceMicro and Nano Engineering Conference; September 26-29, 1994; Davos, Switzerland.
dc.source.conferencedate26/09/1994
dc.source.conferencelocationDavos Switzerland
dc.title

DUV Lithography for 0.35 µm CMOS Processing

dc.typeOral presentation
dspace.entity.typePublication
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